01 Jul Cymer Qualifies New Argon Fluoride (ArF) Light Source, Reducing Edge Placement Error for the Most Advanced Nodes
The new XLR 960ix improves local critical dimension uniformity (CDU), decreasing chipmaker's patterning defects to increase yield of immersion lithography systems SAN DIEGO, July 1, 2020 -- Cymer, an industry leader in developing lithography light sources used by chipmakers to pattern advanced semiconductor chips, today announced...