ArF DRY LIGHT SOURCES
ArF dry lithography is essential in the chipmaking process. ArF dry lithography light sources, like Cymer’s XLA 105, are being used to consistently pattern a significant number of mid-critical layers on wafers, while providing extended module lifetimes and greater critical dimension (CD) control.
As CDs continue to shrink and drive demand for even finer resolution on the most critical layers, ArF dry lithography tools are also patterning the non-critical layers, historically patterned by KrF light sources. Cymer’s dry lithography light sources provide reliability and cost efficiency, and are ideal for use in high volume manufacturing.
XLA 105
Chamber
Dual MOPA
Wavelength
193 nm
Power
45W
Bandwidth Control
<500 fm
XLA 105
ArF dry lithography is essential in the chipmaking process. ArF dry lithography light sources, like Cymer’s XLA 105, are patterning a significant number of mid-critical layers on wafers, while providing extended module lifetimes and greater critical dimension (CD) control. As CDs continue to shrink and drive demand for even finer resolution on the most critical layers, ArF dry lithography tools are also patterning the non-critical layers, historically patterned by KrF light sources. Cymer’s dry lithography light sources provide reliability and cost efficiency, and are ideal for use in high volume manufacturing.
XLR 700d
The XLR 700d provides chipmakers tighter bandwidth control (300 +/-5fm) that essentially eliminates bandwidth as a source of process variation for on-wafer performance. Cymer’s patented technology applies high-speed closed loop control on a pulse-by-pulse basis, resulting in extremely stable performance.
XLR 700d
Chamber
Dual Ring
Wavelength
193 nm
Power
45-90 W
Bandwidth Control
DynaPulse™