ArF IMMERSION LIGHT SOURCES

ArFi: Extending the Life of the 193 nm Wavelength

ArF (argon fluoride) immersion light sources feature a 193 nm wavelength for patterning critical layers during IC production and for multi-patterning applications that support the world’s most advanced semiconductor production nodes.

Cymer continues to push the limits of our light source capabilities, so that chipmakers can push their design limits. As chipmakers continue to reduce the feature sizes and shrink CDs on the wafer, they need to install the advanced tools required to enable patterning of the most critical layers.

 

Cymer’s portfolio of immersion light sources incorporate the latest productivity improvements. Our newest XLR 800ix is the fourth-generation argon fluoride (ArF) light source with extendable power to fit changing needs.

 

Cymer introduced an innovative light source architecture with the XLR 500i in 2007, commercializing a recirculating ring technology for high volume semiconductor manufacturing. This fundamental design architecture has shown to be extendible across multiple device nodes, starting with 90 nm all the way to 10 nm and beyond.

XLR 700ix

Chamber Dual Ring
Wavelength 193 nm
Power 60-90 W
Bandwidth Control DynaPulse™

XLR 700ix

Built on the recirculating ring technology of the XLR platform, the 700ix provides improvements in bandwidth, wavelength and energy stability, enabling higher scanner throughput and process stability for advanced chip manufacturing.

The XLR 700ix provides chipmakers tighter bandwidth control (300 +/- 5 fm wafer average) that essentially eliminates bandwidth as a source of process variation for on-wafer performance. Cymer’s patented technology applies high-speed closed loop control on a pulse-by-pulse basis, resulting in extremely stable performance.

XLR 800ix

The XLR 800ix introduces new bandwidth stabilization technology, enabling an eight times improvement in bandwidth measurement fidelity, which can be used to tightly control bandwidth stability. It also delivers productivity and cost-of-ownership improvements, enabling a 33% increase in time between service intervals to 40 billion pulses. This is driven by Cymer’s new field-tested chamber and optics modules, which are in production in more than 250 XLR systems. These enhancements also support Cymer’s sustainability initiatives, by lowering total system power consumption by several percentage points.

XLR 800ix

Chamber Dual Ring
Wavelength 193 nm
Power 60-120 W
Bandwidth Control DynaPulse™
DynaPulse™ 2
Tunable bandwidth

Scanner-Laser Associations

Scanner Model
XLR 700ix
XLR 800ix
ASML NXT: 1980
ASML NXT: 1980
ASML NXT: 1980
ASML NXT: 2000
ASML NXT: 2000
ASML NXT: 2000
Nikon S622D
Nikon S622D
Nikon S622D
Nikon S635E
Nikon S635E
Nikon S635E