ArF IMMERSION LIGHT SOURCES
ArF (argon fluoride) immersion light sources feature a 193 nm wavelength for patterning critical layers during IC production and for multi-patterning applications that support the world’s most advanced semiconductor production nodes.
Cymer continues to push the limits of our light source capabilities, so that chipmakers can push their design limits. As chipmakers continue to reduce the feature sizes and shrink CDs on the wafer, they need to install the advanced tools required to enable patterning of the most critical layers.
Cymer’s portfolio of immersion light sources incorporate the latest productivity improvements. Our newest XLR 900ix is the fifth-generation argon fluoride (ArF) light source with extendable power to fit changing needs.
Cymer introduced an innovative light source architecture with the XLR 500i in 2007, commercializing a recirculating ring technology for high volume semiconductor manufacturing. This fundamental design architecture has shown to be extendible across multiple device nodes, starting with 90 nm all the way to 7 nm and beyond.
XLR 900ix
Chamber
Dual Ring
Wavelength
193 nm
Power
60-90 W
Bandwidth Control
DynaPulse™ 2
XLR 900ix
The XLR 900ix introduces new speckle reduction technology, enabling a 30% reduction in speckle contrast and enabling significant local CDU improvement. It also delivers productivity and cost-of-ownership improvements, enabling a 25% increase in time between service intervals enabling a single touch per year. This is driven by Cymer’s new field-tested chamber and optics modules, which are in production in more than 140 XLR systems. The system also features new machine learning technology to increase availability through fewer calibrations and gas refresh events while enabling sustainability improvements through lower power and gas consumption.
XLR 800ix
The XLR 800ix introduces new bandwidth stabilization technology, enabling an eight times improvement in bandwidth measurement fidelity, which can be used to tightly control bandwidth stability. It also delivers productivity and cost-of-ownership improvements, enabling a 33% increase in time between service intervals to 40 billion pulses. This is driven by Cymer’s new field-tested chamber and optics modules, which are in production in more than 250 XLR systems. These enhancements also support Cymer’s sustainability initiatives, by lowering total system power consumption by several percentage points.
XLR 700ix
Chamber
Dual Ring
Wavelength
193 nm
Power
60-90 W
Bandwidth Control
DynaPulse™