Cymer Products

XLR 700 (Dry)

Cymer’s XLR 700 is the latest in flexible light source technology for ArF dry lithography.

Category:
Description

The XLR 700 provides chipmakers tighter bandwidth control (300 +/-5fm) that essentially eliminates bandwidth as a source of process variation for on-wafer performance. Cymer’s patented technology applies high-speed closed loop control resulting in extremely stable performance.

XLR 700 Class 4 Label
Additional Information
Features

5th generation chamber technology
DynaPulse™ bandwidth control technology

Upgrade Features

ADAPT

Chamber

Dual Recirculating Ring

Wavelength

193 nm

Power

45-90W

Bandwidth Control

DynaPulse™