Cymer Products

XLR 700ix (Dry)

Cymer’s XLR 700ix is the latest in flexible light source technology for ArF dry lithography.

Category:
Description

The XLR 700ix provides chipmakers tighter bandwidth control (300 +/-5fm) that essentially eliminates bandwidth as a source of process variation for on-wafer performance. Cymer’s patented technology applies high-speed closed loop control on a pulse-by-pulse basis, resulting in extremely stable performance.

Additional Information
Features

Reduction in helium consumption by 50%, Stable performance across all conditions, event in high-duty cycles, Reduces power consumption by 15% through the inclusion of the MO chamber system

Software Updates

Auto chamber conditioning, Automated gas optimization

Upgrade Features

DynaPulse™ 2 Bandwidth Control

Chamber

Dual Recirculating Ring

Wavelength

193 nm

Power

60-90W

Bandwidth Control

DynaPulse™