TECHNICAL PAPERS - Cymer
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TECHNICAL PAPERS

2018 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– Advanced Light Source Technologies for Memory and Logic Processes

 

– Hotspots that Impact Defectivity from Light Source BW Variation Using LMC

 

– Tunable Bandwidth for Application-Specific SAxP Process Enhancement

 

– DUV Sustainability Achievements and Next Steps

2017 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– Next-Generation DUV Light Source Technologies for 10nm and Below

 

– The Impact of Lower Light Source Bandwidth on Sub-10nm Process Node Features

 

– Image Contrast Enhancement of Multiple Patterning Features through Lower Bandwidth

 

– Assessment of Light Source Bandwidth Impacts on Image Contrast Enhancement Using PWD

 

– Advances in DUV Light Source Sustainability

2016 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– Lower BW and Its Impact on the Patterning Performance

 

– Neon Reduction Program on Cymer ArF Light Sources

 

– Impact of Bandwidth Variation on OPC Model Accuracy

 

– DUV Light Source Technologies for 10nm and Below

 

– Means to Improve Light Source Productivity: From Proof of Concept to Field Implementation

2015 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– Advanced Process Characterization Using Light Source Performance Modulation and Monitoring

 

– DUV ArF Light Source Automated Gas Optimization for Enhanced Repeatability and Availability

 

– Impact of Bandwidth on Contrast Sensitive Structures for Low K1 Lithography

 

– New ArF Immersion Light Source Introduces Technologies for High-Volume 14nm Manufacturing and Beyond

 

– Optimum ArFi Light Source Bandwidth for 10nm Node Logic Imaging Performance

 

– Performance of ETC Controller in High Volume Production

2014 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– Estimation of 1D Proximity Budget Impacts due to Light Source for Advanced Node Design

 

– Flexible Power 90W to 120W ArF Immersion Light Source for Future Semiconductor Lithography

 

– Improvements in Bandwidth and Wavelength Control for XLR 660xi Systems

 

– Improving On-Wafer CD Correlation Analysis Using Advanced Diagnostics and Across-Wafer Light-Source Monitoring

2013 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– CO2 / Sn LPP EUV Sources for device development and HVM

 

– High Power 120W ArF immersion XLR laser system for high dose applications

 

– Laser Produced Plasma EUV Light Source for EUVL Patterning at 20nm Node and Beyond

 

– Lithography imaging control by enhanced monitoring of light source performance

2012 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– Advanced Light Source Technologies that Enable High-Volume Manufacturing of DUV Lithography Extensions

 

– Enhancing Lithography Process Control Through Advanced, On-board Beam Parameter Metrology for Wafer Level Monitoring of Light Source Parameters

 

– Field performance availability improvements in lithography light sources using the iGLX™ Gas Management System

 

– Laser Produced Plasma EUV Sources for Device Development and HVM

2011 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– Focus Drilling for Increased Process Latitude in High-NA Immersion Lithography

 

– High-Range Laser Light Bandwidth Measurement and Tuning

 

– Laser Produced Plasma Light Source for EUVL

 

– LPP Source System Development for HVM

2010 SPIE ADVANCED LITHOGRAPHY CONFERENCE

– High Reliability ArF Light Source for Double Patterning Immersion Lithography

 

– Laser Bandwidth Effect on Overlay Budget and Imaging for the 45nm and 32nm Technology Nodes with Immersion Lithography

 

– Laser Produced Plasma Light Source for EUVL

 

– Laser Spectrum Requirements for Tight CD Control at Advanced Logic Technology Nodes

 

– Lithography Light Source Fault Detection

 

– LPP Source System Development for HVM