LIGHT SOURCE TECHNOLOGY

Acquired by ASML in 2013, we are an independently operated business that develops, manufactures and services deep-ultraviolet (DUV) light sources. Our product portfolio includes excimer lasers using argon fluoride (ArF) or krypton fluoride (KrF) gases to generate light in the deep-ultraviolet spectrum. These lasers generate the light that photolithography scanners use to image patterns on silicon wafers.

Cymer holds hundreds of patents for Light Source Technology that began at the birth of DUV lithography.

To see our latest technology innovations, see our recent publications here.

Cymer research and development has been enabling semiconductor manufacturing since the introduction of the first KrF light source in 1988. Since then, we have introduced significant advances in product performance through Solid State Power technology, 193nm lithography and dual chamber architecture, among many others. Our technology has been adopted worldwide as the source for semiconductor manufacturing.

Learn how a DUV light source works