XLA 105HP - Cymer
506
product-template-default,single,single-product,postid-506,woocommerce,woocommerce-page,woocommerce-no-js,ajax_fade,page_not_loaded,,columns-3,qode-child-theme-ver-1.0.0,qode-theme-ver-16.8,qode-theme-bridge,qode_header_in_grid,wpb-js-composer js-comp-ver-5.7,vc_responsive
 

Cymer Products

XLA 105HP

Cymer’s Leading ArF Dry Light Source

Category:
Description

ArF dry lithography is essential in the chipmaking process. ArF dry lithography light sources, like Cymer’s XLA 105, are patterning a significant number of mid-critical layers on wafers, while providing extended module lifetimes and greater critical dimension (CD) control.  As CDs continue to shrink and drive demand for even finer resolution on the most critical layers, ArF dry lithography tools are also patterning the non-critical layers, historically patterned by KrF light sources. Cymer’s dry lithography light sources provide reliability and cost efficiency, and are ideal for use in high volume manufacturing.

Additional Information
Features

Neon savings through XL platform consolidated software
E95 bandwidth monitoring

Upgrade Features

Automatic bandwidth stabilization enabling bandwidth control

Chamber

Dual MOPA

Wavelength

193 nm

Power

45W

Bandwidth Control

<500 fm