ArF dry lithography is essential in the chipmaking process. ArF dry lithography light sources, like Cymer’s XLA 105, are patterning a significant number of mid-critical layers on wafers, while providing extended module lifetimes and greater critical dimension (CD) control.  As CDs continue to shrink and drive demand for even finer resolution on the most critical layers, ArF dry lithography tools are also patterning the non-critical layers, historically patterned by KrF light sources. Cymer’s dry lithography light sources provide reliability and cost efficiency, and are ideal for use in high volume manufacturing.