The new XLR 960ix improves local critical dimension uniformity (CDU), decreasing chipmaker's patterning defects to increase yield of immersion lithography systems SAN DIEGO, July 1, 2020 -- Cymer, an industry leader in developing lithography light sources used by chipmakers to pattern advanced semiconductor chips, today announced...
SAN DIEGO, Aug. 27, 2018 – Cymer, a leading manufacturer of excimer lasers used in semiconductor manufacturing, today announced the first customer installation of its XLR 860ix light source, which is expected to be used in the production of chips at advanced logic and memory...
XLR 800ix performance exceeds expectations, driving strong customer demand SAN DIEGO, Aug. 27, 2018 – Cymer, an industry leader in developing lithography light sources used by chipmakers to pattern advanced semiconductor chips, today announced the first shipment of the newly qualified XLR 800ix light source that...
Reduces maintenance frequency leading to improved cost of ownership SAN DIEGO, June 21, 2017 – Cymer, an industry leader in developing lithography light sources used by chipmakers to pattern advanced semiconductor chips, today announced a new productivity package with enhanced chamber and optics technology for its...