TECHNICAL PAPERS

Want to learn more about what Cymer does? You’ve come to the right place.

In-depth studies of excimer laser illumination resources aren’t what most of our site visitors want or need. Some of you do, though, so we’re happy to share a variety of papers and presentations prepared by our engineers. Many of these were originally presented at global semiconductor industry conferences and subsequently appeared in print or online publications that cater to the industry.

2016 SPIE Advanced Lithography Conference

  • Lower BW and Its Impact on the Patterning Performance
  • Neon Reduction Program on Cymer ArF Light Sources
  • Impact of Bandwidth Variation on OPC Model Accuracy
  • DUV Light Source Technologies for 10nm and Below
  • Means to Improve Light Source Productivity: From Proof of Concept to Field Implementation

Cymer Manuscripts | 2016 SPIE Advanced Lithography Conference

2015 SPIE Advanced Lithography Conference

  • Advanced Process Characterization Using Light Source Performance Modulation and Monitoring
  • DUV ArF Light Source Automated Gas Optimization for Enhanced Repeatability and Availability
  • Impact of Bandwidth on Contrast Sensitive Structures for Low K1 Lithography
  • New ArF Immersion Light Source Introduces Technologies for High-Volume 14nm Manufacturing and Beyond
  • Optimum ArFi Light Source Bandwidth for 10nm Node Logic Imaging Performance
  • Performance of ETC Controller in High Volume Production

Cymer Manuscripts | 2015 SPIE Advanced Lithography Conference

2014 SPIE Advanced Lithography Conference

  • Estimation of 1D Proximity Budget Impacts due to Light Source for Advanced Node Design
  • Flexible Power 90W to 120W ArF Immersion Light Source for Future Semiconductor Lithography
  • Improvements in Bandwidth & Wavelength Control for XLR 660xi Systems
  • Improving On-Wafer CD Correlation Analysis Using Advanced Diagnostics and Across-Wafer Light-Source Monitoring

Cymer Manuscripts | 2014 SPIE Advanced Lithography Conference

2013 SPIE Advanced Lithography Conference

  • CO2 / Sn LPP EUV Sources for device development and HVM
  • High Power 120W ArF immersion XLR laser system for high dose applications
  • Laser Produced Plasma EUV Light Source for EUVL Patterning at 20nm Node and Beyond
  • Lithography imaging control by enhanced monitoring of light source performance

Cymer Manuscripts | 2013 SPIE Advanced Lithography Conference

2012 SPIE Advanced Lithography Conference

  • Advanced Light Source Technologies that Enable High-Volume Manufacturing of DUV Lithography Extensions
  • Enhancing Lithography Process Control Through Advanced, On-board Beam Parameter Metrology for Wafer Level Monitoring of Light Source Parameters
  • Field performance availability improvements in lithography light sources using the iGLX™ Gas Management System
  • Laser Produced Plasma EUV Sources for Device Development and HVM

Cymer Manuscripts | 2012 SPIE Advanced Lithography Conference

2011 SPIE Advanced Lithography Conference

  • Focus Drilling for Increased Process Latitude in High-NA Immersion Lithography
  • High-Range Laser Light Bandwidth Measurement and Tuning
  • Laser Produced Plasma Light Source for EUVL
  • LPP Source System Development for HVM

Cymer Manuscripts | 2011 SPIE Advanced Lithography Conference

2010 SPIE Advanced Lithography Conference

  • High Reliability ArF Light Source for Double Patterning Immersion Lithography
  • Laser Bandwidth Effect on Overlay Budget and Imaging for the 45nm and 32nm Technology Nodes with Immersion Lithography
  • Laser Produced Plasma Light Source for EUVL
  • Laser Spectrum Requirements for Tight CD Control at Advanced Logic Technology Nodes
  • Lithography Light Source Fault Detection
  • LPP Source System Development for HVM

Cymer Manuscripts | 2010 SPIE Advanced Lithography Conference