SPIE Spotlight | Will Conley Discusses Lower Light Source Bandwidth

Will Conley | SPIE Advanced Lithography Conference Co-Chair

Will Conley, Cymer/ASML Staff Applications Manager and SPIE Advanced Lithography Co-Chair, will discuss the impact of lower light source bandwidth at SPIE 2017.

Meet Will Conley, our Staff Applications Manager here at Cymer/ASML. Originally from Highland Falls, (if you have been to Military Academy at West Point, you’ve been through Highland Falls) in the Mid-Hudson Valley of New York, Will worked for IBM Microelectronics Division in East Fishkill, New York, before moving to Austin, Texas, to work in the Motorola Semiconductor Division which later became Freescale Semiconductor (which was purchased by NXP and is being purchased by Qualcomm). In May 2012, Will moved to San Diego to work at Cymer/ASML.

“My focus is the application of the Laser as part of the Imaging System (Scanner). Much of my focus is on working with customers to determine if new features on the laser can improve process capability.”

“My favorite part about Cymer is that of the companies I’ve worked for, it is the most active in the community.”

Outside of work, Will enjoys cycling, golfing, and watching baseball – especially when the Mets are in San Diego playing the Padres.

With more than 30 years in the industry, Will is an active member of SPIE, with his first paper presented at SPIE Conference on Advanced Lithography in 1989 – and he’s presented a paper every year since. His first committee involvement started in 1995 as part of the Materials Conference, where he chaired that conference from 1998 to 1999. In 2007, Will was elected Fellow of SPIE, and continued to serve on the committee from 2007 to 2011, then the Information Technology Committee from 2011 to 2014. Last year, Will was named co-chair of the overall Advanced Lithography Conference, and will serve in that capacity through 2018. In 2019 and 2020, Will becomes the Chair of the conference.

After this year’s conference, he will have authored or co-authored exactly 140 papers at the Advanced Lithography Conference. He also holds 25 patents, with five (5) patents pending.

Will is chairing the opening plenary session of this year’s SPIE Conference on Advanced Lithography on Monday morning, during the time session awards are given, new Fellows of Society are recognized and the three keynote speakers make their introductions and presentations.

On Tuesday, February 28, from 10:30am – 12:00pm in the Optical Microlithography sub-conference, he will discuss the impact of lower light source bandwidth on sub-10nm process node features.

“The work is co-authored with ASML TDC Taiwan and ASML Brion in San Jose in support of TSMC. Increasing image through Source Mask Optimization (SMO) and Optical Proximity Correction (OPC) models are delivered when using 200 fm light source E95 bandwidth. Using test constructs that follow current N7/N5 ground rules and multiple pattern deconstruction rules, improvements in Exposure Latitude (EL), Critical Dimension (CD) and Mask Error Enhancement Factor (MEEF) performance are observed when SMO and OPC are optimized for 200 fm light source bandwidth when compared with the standard 300 fm bandwidth. New SMO-OPC flows will be proposed that users can follow to maximize process benefit. The predicted responses will be compared with the experimental on wafer responses of 7nm features to lower light source bandwidth.”

Later on in the week on March 2 at 10:30am, Will presents the Cymer Leadership Award for Best Student Paper. Cymer has supported a “best student” paper for the last 15 years, where a committee of attendees ranks and rates each student paper with the purpose of determining the best paper.