DUV lithography is the workhorse of photolithography, and as such is expected to be used in conjunction with EUV in the near future to produce the most advanced integrated circuits available. If you’d like to dive deeper into DUV or EUV technology you can access papers written by Cymer subject matter experts.
Cymer DUV lithography light sources fall into three overarching categories: ArF Immersion, ArF Dry, and KrF.
ArF (argon fluoride) Immersion light sources feature a 193 nm wavelength for patterning critical layers during IC production and for multi-patterning applications that support 14 nm node production and beyond. Immersion refers to the layer of fluid placed between the wafer and optics for changing the beam and increasing depth of focus and resolution. Our leading platform, the XLR 700ix, is an ArF Immersion light source with a 193 nm wavelength.
KrF light sources are the predecessors to both ArF Dry and Immersion models, used primarily for high-volume manufacturing of non-critical layers to maximize productivity and cost-effectiveness. They produce 248 nm wavelength light.