In late February members of the Cymer and extended ASML brain trust headed to San Jose, California, for the 38th annual SPIE Advanced Lithography Conference, a weeklong event featuring courses, exhibitions, and 500 presentations.
It was a busy week for Will Conley, member of the CLS Applications Team: he presented his study Impact of Bandwidth Variation on OPC Model Accuracy, presented the Best Student Paper Award Optical Microlithography, and was named SPIE Symposium Co-Chair (replacing Mircea Dusa of ASML). We caught up with Will in between presentations and asked him what responsibilities a SPIE Symposium Chair has.
Congratulations to Will and everyone who presented on behalf of Cymer—and best of luck preparing your 2017 presentations.
- Impact of Bandwidth Variation on OPC Model Accuracy (W. Conley, P. Alagna, S. Hsu, Q. Zhao)
- DUV Light Source Technologies for 10nm and Below (T. Cacouris, G. Rechtsteiner, W. Conley, P. Alagna)
- Neon Reduction Program on Cymer ArF Light Sources (D. Kanawade, Y. Roman, T. Cacouris, J. Thornes, K. O’Brien)
- Means to Improve Light Source Productivity: From Proof of Concept to Field Implementation (E. Rausa, T. Cacouris, W. Conley, M. Jackson, S. Luo, S. Murthy, G. Rechtsteiner, K. Steiner)
- Lower BW and Its Impact on the Patterning Performance (P. Alagna, G. Rechtsteiner, V. Timoshkov, P. Wong, W. Conley, J. Baselmans)