The XLR 500i is built upon the solid foundation already established by the MOPA-based, dual-chamber XL Series product line. The XLR 500i is specifically designed for high NA immersion scanner lithography tools, targeted for 45nm semiconductor production. When chipmakers looked for an immersion light source solution for 45nm patterning, Cymer delivered the XLR 500i.

Continuous advancements in scanner lithography tools have made the reduction in critical dimensions (CD) possible. As semiconductor processing moves into the 45nm immersion lithography and beyond, lithography technology needed to address challenges to achieve improved resolution. The XLR 500i provides the critical features of precision, stability and operational efficiency to meet shrinking CD budgets by improving process control and maintaining affordability, primarily through improvements in wafer productivity.

 

As the fifth generation of the most tested and proven lineage of light sources, the XLR 500i incorporated a new optical architecture where the amplification stage is regenerative rather than double-pass. This new architecture is known as Recirculating Ring Technology. The Recirculating Ring Technology reduces the cost of ownership by increasing module lifetime. The XLR 500i is also designed to address the rising running costs of advanced ArF lithography. This is accomplished by a breakthrough, patented chamber design that provides a 2X (100%) increase in lifetime. Furthermore, advanced materials are enabling a lifetime extension of the line-narrowing module. The Recirculating Ring Technology approach represents a major step-function improvement in the cost curve for ArF lithography light sources and further establishes a new standard in laser light source lithography technology. Along with Gas Lifetime eXtension (GLX), the XLR 500i is a powerful ArF lithography light source that offers even greater cost savings advantages.

Operating at a 6kHz repetition rate and offering up to 60 Watts of output power, the XLR 500i is designed to enable cost-effective, high-volume 45nm immersion lithography and below. 

The XLR 500i is also field upgradeable to a XLR 600ix to provide 90 Watts for double patterning applications.