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Technical Publications

Cymer is the world's leading supplier of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) and extreme ultraviolet (EUV) photolithography systems used in the manufacturing of semiconductors. Cymer engineers are continually performing research on the products, parts and features of the lasers. Many of the innovations and studies that come about from the research are presented at conferences around the world and in industry publications. These technical paper are also available here.

2012

SPIE: Advanced Lithography 2012

Advanced Light Source Technologies that Enable High-Volume Manufacturing of DUV Lithography Extensions

Enhancing Lithography Process Control Through Advanced, On-board Beam Parameter Metrology for Wafer Level Monitoring of Light Source Parameters

Field performance availability improvements in lithography light sources using the iGLX™ Gas Management System

Laser Produced Plasma EUV Sources for Device Development and HVM

2011

SPIE: Advanced Lithography 2011

Focus Drilling for Increased Process Latitude in High-NA Immersion Lithography

High-Range Laser Light Bandwidth Measurement and Tuning

Laser Produced Plasma Light Source for EUVL

LPP Source System Development for HVM

2010

SPIE: Advanced Lithography 2010

High Reliability ArF Light Source for Double Patterning Immersion Lithography

Laser Bandwidth Effect on Overlay Budget and Imaging for the 45nm and 32nm Technology Nodes with Immersion Lithography

Laser Produced Plasma Light Source for EUVL

Laser Spectrum Requirements for Tight CD Control at Advanced Logic Technology Nodes

Lithography Light Source Fault Detection

LPP Source System Development for HVM

2009

SPIE: Advanced Lithography 2009

32nm Node Device Laser-Bandwidth OPE Sensitivity and Process Matching

Challenges of Long Term Process Stability and Solutions for Better Control

Enabling High Volume Manufacturing of Double Patterning Immersion Lithography with the XLR 600ix ArF Light Source

Improved Model Predictability by Machine Data in Computational Lithography and Application to Laser Bandwidth Tuning

Laser-Produced Plasma Light Source for EUVL

Lithography Line Productivity Impact Using Cymer GLX Technology

LPP Source System Development for HVM

Modeling Laser Bandwidth for OPC Applications

Lithography Asia 2009

Flexible 60-90W ArF Light Source for Double Patterning Immersion Lithography in High Volume Manufacturing

25th European Mask and Lithography Conference

Lithography Light Source Challenges for Double Patterning and EUVL

Journal of Micro/Nanolithography, MEMS, and MOEMS

Performance Results of Laser Produced Plasma Test and Prototype Light Sources for EUV Lithography

Residual Speckle in a Lithographic Illumination System

2008

SPIE: Advanced Lithography 2008

45nm Node Logic Device OPE Matching Between Exposure Tools Through Laser Bandwidth Tuning

Effects of Laser Bandwidth on Tool to Tool CD Matching

Enhanced Reflectivity and Stability of High-Temperature LPP Collector Mirrors

Performance Demonstration of Significant Availability Improvement in Lithography Light Sources Using GLX Control System

XLR 600i: Recirculating Ring ArF Light Source for Double Patterning Immersion Lithography

Lithography Asia 2008

Analysis of the Effect of Laser Bandwidth on Imaging of Memory

CD Control Enhancement by Laser Bandwidth Stabilization for Advanced Lithography Application

Laser Produced Plasma Source System Development

Photomask Technology 2008

Defining a Physically Accurate Laser Bandwidth Input for Optical Proximity Correction (OPC) and Modeling

Journal of Micro/Nanolithography, MEMS, and MOEMS

Impact of Finite Laser Bandwidth on the Critical Dimension of L/S Structures

2007

SPIE: Advanced Lithography 2007

Challenging to Meet 1nm Iso-Dense Bias (IDB) by Controlling Laser Spectrum

Effect of Deposition, Sputtering, and Evaporation of Lithium Debris Buildup on EUV Optics

Effects of Laser Bandwidth on Iso-Dense Bias and Line End Shortening at Sub-Micron Process Nodes

Increased Availability of Lithography Light Sources Using Advanced Gas Management

Laser Produced Plasma Source System Development

LPP EUV Source Development for HVM

Modeling and Performance Metrics for Longitudinal Chromatic Aberrations, Focus-Drilling, and Z-Noise: Exploring Excimer Laser Pulse-Spectra

Study of Iso-Dense Bias (IDB) Sensitivity to Laser Spectral Shape at the 45nm Node

XLR 500i: Recirculating Ring ArF Light Source for Immersion Lithography

Photomask Technology 2007

Fast and Accurate Laser Bandwidth Modeling of Optical Proximity Effects

Journal of Micro/Nanolithography, MEMS, and MOEMS

Plasma Cleaning of Lithium Off of Collector Optics Material for Use in Extreme Ultraviolet Lithography Applications

2006

SPIE: Advanced Lithography 2006

Active Spectral Control of DUV Light Sources for OPE Minimization

Effects of Laser Bandwidth on OPE in a Modern Lithography Tool

EUV Source Collector

High Power Low Cost Drive Laser for LPP Source

High-Temperature LPP Collector Mirror

LPP EUV Source Development for HVM

XLA 300: The Fourth Generation ArF MOPA Light Source for Immersion Lithography

2005

SPIE: Advanced Lithography 2005

Development in Gas Discharge Drive Lasers for LPP EUV Sources

EUV Source System Development Update: Advancing Along The Path to HVM

Evolution of Light Source Technology to Support Immersion and EUV

Liquid Metal Micro Droplet Generator for Laser Produced Plasma Target Delivery Used in an Extreme Ultraiolet Source

LPP EUV Conversion Efficiency Optimization

Metrology of Laser Produced Plasma Light Source for EUV Lithography

Protection of Collector Optics in an LPP Based EUV Source

Radiation-Hydrodynamics Spectral and Atomic Physics Modeling of Laser Produced Plasma EUVL Light Sources

2004

SPIE: Advanced Lithography 2004

6 kHz MOPA Light Source for 193 nm Immersion Lithography

Long-term Reliable Operation of a MOPA-based ArF Light Source for Microlithography

Overcoming Limitations of Etalon Spectrometers used for Spectral Metrology of DUV Excimer Light Sources

Performance and Reliability of Beam Delivery Unit for Advanced Lithography

Performance and Scaling of a Dense Plasma Focus Light Source for EUV Lithography

RELAX: Resolution Enhancement by Laser-Spectrum Adjusted Exposure

The Effect of Polarized 193nm Irradiation on Photomask Haze Formation

Verification of Compaction and Rarefaction Models for Fused Silica with 40 Billion Pulses of 193-nm Excimer Laser Exposure and Their Effects on Projection Lens Imaging Performance

XLA 200: The Third-Generation ArF MOPA Light Source for Immersion Lithography

2003

SPIE: Advanced Lithography 2003

Compaction and Rarefaction of Fused Silica with 193-nm Excimer Laser Exposure

Dual Chamber Ultra Line Narrowed Excimer Light Source for 193-nm Lithography

High-Performance Beam Stabilization for Next Generation ArF Scanner Systems

Performance and Scaling of a Dense Plasma Focus Light Source for EUV Lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Understanding Chromatic Aberration Impacts on Lithographic Imaging

2002

SPIE: Advanced Lithography 2002

Influence of Laser Spatial Parameters and Illuminator Pupil-fill Performance on the Lithographic Performance of a Scanner

Optimization of a Dense Plasma Focus Device as a Light Source for EUV Lithography

Production-Ready 4-kHz ArF Laser for 193-nm Lithography

21st Annual BACUS Symposium on Photomask Technology

Contribution of Polychromatic Illumination to Optical Proximity Effects in the Context of Deep-UV Lithography

Illumination Spectral Width Impacts on Mask Error Enhancement Factor and Iso-Dense Bias in 0.6NA KrF Imaging

2001

SPIE: Advanced Lithography 2001

Advanced VUV Spectrometer for F2 Laser Metrology

Behavior of Lens Aberrations as a Function of Wavelength on KrF and ArF Lithography Scanners

Challenges of Laser Spectrum Metrology in 248 and 193nm Lithography

Effects of 95% Integral vs. FWHM Bandwidth Specifications on Lithographic Imaging

Investigation of Cross-Field Wavefront Aberrations of KrF Lithography Exposure Systems as a Function of Excimer Laser Bandwidth

Next Generation 193nm Laser for Sub-100-nm Lithography

Optical Damage Testing of Materials for Use in 157-nm Photolithographic Systems

Progress Toward Use of a Dense Plasma Focus as a Light Source for Production EUV Lithography

Wavelength Stabilization in an Excimer Laser Source Using Piezoelectric Active Vibration Control

XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference

Excimer Laser as a Total Light Source Solution for DUV Microlithography

2000

SPIE: Advanced Lithography 2000

Behavior of Fused Silica Materials for Microlithography Irradiated at 193 nm with Low-Fluence ArF Radiation for Tens of Billions of Pulses

Comparison of ArF and KrF Laser Performance at 2 kHz for Microlithography

Development of an EUV (13.5nm) Light Source Employing a Dense Plasma Focus in Lithium Vapor

Extending the Performance of KrF Laser for Microlithography by Using Novel F2 Control Technology

Feasibility of Highly Line-Narrowed F2 Laser for 157 nm Microlithography

Laser Spectrum Line Shape Metrology at 193 nm

Modeling the Effects of Excimer Laser Bandwidths on Lithographic Performance

Performance of Very High Repetition Rate ArF Lasers

Prospects for Long Pulse Operation of ArF Lasers for 193nm Microlithography

Laser-Induced Damage in Optical Materials: 2000

Behavior of Fused Silica Irradiated by Low Level 193nm Excimer Laser for Tens of Billions of Pulses

1999

SPIE: Advanced Lithography 1999

EUV (13.5-nm) Light Generation Using a Dense Plasma Focus Device

Novel Metrology for Measuring Spectral Purity of KrF Lasers for Deep UV Lithography

Numerical Modeling of the Excimer Beam

Performance Characteristics of Ultranarrow ArF Laser for DUV Lithography

Production Ready 2-kHz KrF Excimer Laser for DUV Lithography

Revisiting F2 Laser for DUV Microlithography

1998

SPIE: Advanced Lithography 1998

ArF Lasers for Production of Semiconductor Devices with CD < 0.15 µm

Feasibility Studies of Operating KrF Lasers at Ultranarrow Spectral Bandwidths for 0.18 µm Line Widths

1997

SPIE: Advanced Lithography 1997

Performance Characteristics of a High Energy, High Pulse Repetition Frequency Krypton Fluoride Laser

Reliability Studies of 1kHZ KrF Excimer Lasers for DUV Lithography

XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference

Performance of 1 kHz KrF Excimer Laser for DUV Lithography

1996

SPIE: Advanced Lithography 1996

Design Considerations and Performance of 1kHz KrF Excimer Lasers for DUV Lithography

1995

SPIE: Advanced Lithography 1995

A Low Cost of Ownership KrF Excimer Laser Using a Novel Pulse Power and Chamber Configuration

1993

SPIE: Advanced Lithography 1993

High Resolution Spectral Studies and the Absolute Wavelength Calibration of a KrF Excimer Laser for Microlithography

Parametric Studies and the Operating Latitude of a Spectrally Narrowed KrF Excimer Laser for the Deep UV Stepper

Optical Engineering

Krypton Fluoride Excimer Laser for Advanced Microlithography

1992

SPIE: Advanced Lithography 1992

Advanced Krypton Fluoride Excimer Laser for Microlithography

1991

SPIE: Advanced Lithography 1991

Argon Fluoride Excimer Laser Source for Sub-0.25 nm Optical Lithography

Excimer Laser Materials Processing and Beam Delivery Systems

Excimer Lasers for Deep UV Lithography

1990

SPIE: Advanced Lithography 1990

Measurements of Beam Characteristics Relevant to DUV Microlithography on a KrF Excimer Laser

*Copyright Society of Photo-Optical Instrumentation Engineers. This paper was published in and is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

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