TECHNICAL PAPERS
– KrF Multi-Focal Imaging System for Advanced and Legacy Applications
– A Novel Solution on KrF Pixel Layer with Thick Photo Resist (PR) by Single Exposure Multi-Focal Imaging (MFI) Technique
2021 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Full Chip Computational Lithography for KrF Multi-Focal Imaging (MFI)
2020 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Multi-Focal Imaging for Improved Depth of Focus; Principles and Application to ArF Immersion Lithography
– Improving DOF for an Advanced 3D NAND Via Layer using Multi-Focal Imaging
2019 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Quantifying global and local CD variation for an advanced 3D NAND layer
2018 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Advanced Light Source Technologies for Memory and Logic Processes
– Hotspots that Impact Defectivity from Light Source BW Variation Using LMC
– Tunable Bandwidth for Application-Specific SAxP Process Enhancement
– DUV Sustainability Achievements and Next Steps
2017 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Next-Generation DUV Light Source Technologies for 10nm and Below
– The Impact of Lower Light Source Bandwidth on Sub-10nm Process Node Features
– Image Contrast Enhancement of Multiple Patterning Features through Lower Bandwidth
– Assessment of Light Source Bandwidth Impacts on Image Contrast Enhancement Using PWD
– Advances in DUV Light Source Sustainability
2016 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Lower BW and Its Impact on the Patterning Performance
– Neon Reduction Program on Cymer ArF Light Sources
– Impact of Bandwidth Variation on OPC Model Accuracy
– DUV Light Source Technologies for 10nm and Below
– Means to Improve Light Source Productivity: From Proof of Concept to Field Implementation
2015 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Advanced Process Characterization Using Light Source Performance Modulation and Monitoring
– DUV ArF Light Source Automated Gas Optimization for Enhanced Repeatability and Availability
– Impact of Bandwidth on Contrast Sensitive Structures for Low K1 Lithography
– New ArF Immersion Light Source Introduces Technologies for High-Volume 14nm Manufacturing and Beyond
– Optimum ArFi Light Source Bandwidth for 10nm Node Logic Imaging Performance
– Performance of ETC Controller in High Volume Production
2014 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Estimation of 1D Proximity Budget Impacts due to Light Source for Advanced Node Design
– Flexible Power 90W to 120W ArF Immersion Light Source for Future Semiconductor Lithography
– Improvements in Bandwidth and Wavelength Control for XLR 660xi Systems
– Improving On-Wafer CD Correlation Analysis Using Advanced Diagnostics and Across-Wafer Light-Source Monitoring
2013 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– CO2 / Sn LPP EUV Sources for device development and HVM
– High Power 120W ArF immersion XLR laser system for high dose applications
– Laser Produced Plasma EUV Light Source for EUVL Patterning at 20nm Node and Beyond
– Lithography imaging control by enhanced monitoring of light source performance
2012 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Advanced Light Source Technologies that Enable High-Volume Manufacturing of DUV Lithography Extensions
– Enhancing Lithography Process Control Through Advanced, On-board Beam Parameter Metrology for Wafer Level Monitoring of Light Source Parameters
– Field performance availability improvements in lithography light sources using the iGLX™ Gas Management System
– Laser Produced Plasma EUV Sources for Device Development and HVM
2011 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– Focus Drilling for Increased Process Latitude in High-NA Immersion Lithography
– High-Range Laser Light Bandwidth Measurement and Tuning
– Laser Produced Plasma Light Source for EUVL
– LPP Source System Development for HVM
2010 SPIE ADVANCED LITHOGRAPHY CONFERENCE
– High Reliability ArF Light Source for Double Patterning Immersion Lithography
– Laser Bandwidth Effect on Overlay Budget and Imaging for the 45nm and 32nm Technology Nodes with Immersion Lithography
– Laser Produced Plasma Light Source for EUVL
– Laser Spectrum Requirements for Tight CD Control at Advanced Logic Technology Nodes
– Lithography Light Source Fault Detection
– LPP Source System Development for HVM