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XLA 400
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Fifth-generation, leading-edge, 193nm argon fluoride (ArF) light source
Product Overview
The XLA 400 is Cymer’s fifth-generation, leading-edge, 193nm argon fluoride (ArF) light source featuring the production-proven, Master Oscillator Power Amplifier (MOPA) platform-enabling both line-narrowed bandwidth with 60W of output power at 6kHz repetition rate. Higher rep rate of 6kHz enables high throughput to deliver sustained productivity for volume manufacturing. Just as the introduction of water into the process has extended the potential of 193nm lithography, the XLA 400 enables high volume production immersion lithography down to the 45nm process node levels.
By utilizing the ArF (193 nm) exposure wavelength, the XLA 400 enables chip design rules to shrink, which leads to faster processing speeds and boosts memory capacity per chip. With an ultra line-narrowed spectral bandwidth of <0.35pm E95%, the XLA 400 provides the light that enables high contrast imaging for lithography tools with an numerical aperture (NA) up to > 1.3.
Features
- Longer Consumable Lifetimes
- Standard E95% Metrology
- 60W at 6kHz
- Production Proven Platform (XL Series)
Benefits
- Spectral performance measurement to minimize Optical Proximity Errors (OPE)
- Reliable and upgradeable platform offering maximum availability with minimum risk
- Highest repetition rate capability (6kHz) enables higher throughput
- ≤0.35pm Spectral Bandwidth (E95%) enables exposure of most critical features and insight into Optical Proximity Effects
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