The technically advanced ELS-7010 meets the requirements of high volume production of sub-0.10 micron devices on 248 nm exposure tools. The ELS-7010 offers a 4 kHz, 40 W optical output, plus ultra-narrowed bandwidth performance and high-speed wavelength control. Advanced architecture and materials incorporated into the design of the ELS-7010 significantly reduce the light source consumables costs.

The 7000 series product line offers a fully rounded product platform for both KrF and ArF 4 kHz excimer light sources so that customers have the flexibility to “mix and match” products within the same manufacturing environment.
Consider these benefits of the ELS-7010
• Improved Line Narrowing Module (LNM) and Wavelength Stabilization Module (WSM) ensure optimal focus control, maximum exposure latitude, and improved CD control.
• Proprietary design enhancements ensure accurate and better energy dose control.
• The MicroInject™ gas algorithm provides superior energy stability while eliminating non-productive time due to gas injections.
• Cymer’s VERRO™ technology provides “on-the-fly” optimization of pulse energy and repetition rate according to specific exposure conditions, such as resist dose sensitivity and optical transmittance.
• Cost of operation has been significantly reduced through new technology to extend the lifetimes of consumable modules.
• Compatible with Cymer OnLine e-Diagnostics and performance monitoring, enabling remote troubleshooting and predictive maintenance.
• Designed for excellence, the ELS-7010 complies with stringent Semiconductor Industry safety standards.