Cymer’s ELS-6010 enables semiconductor manufacturers to leverage their existing KrF experience during the transition to 130 nm design rules. It provides a highly line-narrowed spectral bandwidth of ≤ 0.5 pm (FWHM) and ≤ 1.4 pm 95 percent energy integral. The ELS-6010 enables full image performance from lithography steppers and scanners using lenses with numerical apertures > 0.75.

Consider these benefits of the ELS-6010:

• Voted as Semiconductor International’s Editor’s Choice Best Product for two years running, the ELS-6010 remains the product of choice by end users.
• High repetition rate increases throughput and improves wafer dose stability.
• A patented technology control interface receives feedback from an energy sensor close to the wafer to deliver greater stability.
• Superior wavelength stability control permits smaller process windows and increase CD control and yield.
• The need for attenuation is dramatically reduced, which conserves the pulse usage and extends the useful lifetime of light source consumables.
• The Microinject™ light source gas algorithm allows precise amounts of KrF gas to be injected into the light source discharge chamber even during exposure sequences to eliminate downtime for gas injections.
• Safety assessments comply with S2-93A, S2-0200, NFPA-79, EN60204 and EN60825 as well as testing to EMC standards and generic IH.