The technically-advanced ELS-7000 meets the requirements of high volume production of sub-0.13 micron devices on 248 nm exposure tools. The ELS-7000 offers a 4 kHz, 30 W optical ouput, plus ultra-low bandwidth performance and high speed wavelength control. Advanced architecture and materials incorporated into the design of the ELS-7000 reduce light source consumables costs.

The ELS-7000 line offers a fully rounded product platform for both KrF and ArF 4 kHz light sources so that customers have the flexibility to “mix and match” products within the same manufacturing environment.

Consider these benefits of the ELS-7000

• A new Line Narrowing Module (LNM) and Wavelength Stabilization Module (WSM) ensure optimal focus control, maximum exposure latitude, and improved CD control.
• Proprietary design enhancements ensure optimum voltage regulation for accurate dose energy control.
• The Microinject™ gas algorithm provides superior energy stability while eliminating non-productive time due to gas injections.
• Cymer’s VERRO™ technology provides “on-the-fly” optimization of pulse energy and repetition rate according to specific exposure conditions, such as resist dose sensitivity and optical transmittance.
• Increased module lifetimes and higher output power lead to a lower cost of operation.
• Designed for excellence, the ELS-7000 adheres to stringent safety standards.