Cymer: Products

Cymer Lithography Light Sources

Cymer drives innovation in the semiconductor industry. The company's next-generation lithography light sources for all wavelengths and applications provide chipmakers with a competitive edge in performance and a greater return on their capital investments. Using Cymer's technology, chipmakers experience increased laser availability, lower cost of ownership, and greater productivity.

Light Sources At-A-Glance

Product	Configuration	Gas	Wavelength	Application	Power	Repetition Rate	Pulse Energy	Spectral Bandwidth
XLR 600i	Dual Chamber Recirculating Ring	ArF	193 nm	Double Patterning / Immersion	90W	6 kHz	15 mJ	E95% < 0.35 pm
XLR 500i	Dual Chamber Recirculating Ring	ArF	193 nm	Immersion	60W	6 kHz	10 mJ	E95% < 0.35 pm
XLA 400	Dual Chamber	ArF	193 nm	Immersion	60W	6 kHz	10 mJ	E95% < 0.35 pm
XLA 300	Dual Chamber	ArF	193 nm	Immersion	60W	6 kHz	10 mJ	E95% < 0.50 pm FWHM < 0.12 pm
XLA 200	Dual Chamber	ArF	193 nm	Dry	60W	4 kHz	15 mJ	E95% < 0.50 pm FWHM < 0.12 pm
XLA 105*	Dual Chamber	ArF	193 nm	Dry	45W	4 kHz	10 mJ	E95% < 0.50 pm FWHM < 0.2 pm
XLA 100	Dual Chamber	ArF	193 nm	Dry	40W	4 kHz	10 mJ	E95% < 0.65 pm FWHM < 0.25 pm
NanoLith™ 7000	Single Chamber	ArF	193 nm	Dry	20W	4 kHz	5 mJ	E95% 0.95 - 1.3 pm FWHM < 0.5 pm
ELS-7010	Single Chamber	KrF	248 nm	Dry	40W	4 kHz	10 mJ	E95% < 1.2 pm FWHM < 0.35 pm
ELS-7000	Single Chamber	KrF	248 nm	Dry	30W	4 kHz	7.5 mJ	E95% < 1.4 pm FWHM < 0.5 pm
ELS-6010	Single Chamber	KrF	248 nm	Dry	20W	2.5 kHz	8 mJ	E95% < 1.4 pm FWHM < 0.5 pm

*	This product is available for upgrade to a High-Performance (HP) laser light source. For more information about the HP product, please see the product page.