| Product |
Configuration |
Gas |
Wavelength |
Application |
Power |
Repetition Rate |
Pulse Energy |
Spectral Bandwidth |
| XLR 600i |
Dual Chamber Recirculating Ring | ArF |
193 nm | Double Patterning / Immersion | 90W | 6 kHz |
15 mJ |
E95% < 0.35 pm |
| XLR 500i |
Dual Chamber Recirculating Ring | ArF |
193 nm |
Immersion |
60W | 6 kHz | 10 mJ | E95% < 0.35 pm |
| XLA 400 |
Dual Chamber |
ArF |
193 nm | Immersion | 60W | 6 kHz | 10 mJ | E95% < 0.35 pm |
| XLA 300 |
Dual Chamber |
ArF |
193 nm |
Immersion |
60W | 6 kHz | 10 mJ | E95% < 0.50 pm
FWHM < 0.12 pm |
| XLA 200 |
Dual Chamber |
ArF |
193 nm |
Dry |
60W | 4 kHz | 15 mJ | E95% < 0.50 pm
FWHM < 0.12 pm |
| XLA 105* | Dual Chamber |
ArF |
193 nm |
Dry |
45W | 4 kHz | 10 mJ | E95% < 0.50 pm
FWHM < 0.2 pm |
| XLA 100 | Dual Chamber |
ArF |
193 nm |
Dry |
40W | 4 kHz | 10 mJ | E95% < 0.65 pm
FWHM < 0.25 pm |
| NanoLith™ 7000 |
Single Chamber |
ArF |
193 nm |
Dry |
20W | 4 kHz | 5 mJ | E95% 0.95 - 1.3 pm
FWHM < 0.5 pm |
| ELS-7010 | Single Chamber | KrF | 248 nm |
Dry |
40W | 4 kHz | 10 mJ | E95% < 1.2 pm
FWHM < 0.35 pm |
| ELS-7000 | Single Chamber | KrF | 248 nm |
Dry |
30W | 4 kHz | 7.5 mJ | E95% < 1.4 pm
FWHM < 0.5 pm |
| ELS-6010 | Single Chamber | KrF | 248 nm |
Dry |
20W | 2.5 kHz | 8 mJ | E95% < 1.4 pm
FWHM < 0.5 pm |