| Cymer Lithography Light Sources
Cymer drives innovation in the semiconductor industry. The company's next-generation lithography light sources for all wavelengths and applications provide chipmakers with a competitive edge in performance and a greater return on their capital investments. Using Cymer's technology, chipmakers experience increased laser availability, lower cost of ownership, and greater productivity.
Light Sources At-A-Glance
| Product |
Configuration |
Gas |
Wavelength |
Application |
Power |
Repetition Rate |
Pulse Energy |
Spectral Bandwidth |
| XLR 600i |
Dual Chamber Recirculating Ring | ArF |
193 nm | Double Patterning / Immersion | 90W | 6 kHz |
15 mJ |
≤ 0.35 pm E95% |
| XLR 500i |
Dual Chamber Recirculating Ring | ArF |
193 nm |
Immersion |
60W | 6 kHz | 10 mJ | ≤ 0.35 pm E95% |
| XLA 400 |
Dual Chamber |
ArF |
193 nm | Immersion | 60W | 6 kHz | 10 mJ | ≤ 0.35 pm E95% |
| XLA 300 |
Dual Chamber |
ArF |
193 nm |
Immersion |
60W | 6 kHz | 10 mJ | ≤ 0.50 pm E95% |
| XLA 200 |
Dual Chamber |
ArF |
193 nm |
Dry |
60W | 4 kHz | 15 mJ | ≤ 0.50 pm E95% |
| XLA 105 | Dual Chamber |
ArF |
193 nm |
Dry |
45W | 4 kHz | 10 mJ | ≤ 0.50 pm FWHM |
| XLA 100 | Dual Chamber |
ArF |
193 nm |
Dry |
40W | 4 kHz | 10 mJ | ≤ 0.65 pm FWHM |
| NanoLith™ 7000 |
Single Chamber |
ArF |
193 nm |
Dry |
20W | 4 kHz | 5 mJ | 0.95-1.3 pm FWHM |
| ELS-7010 | Single Chamber | KrF | 248 nm |
Dry |
40W | 4 kHz | 10 mJ | ≤ 1.2 pm FWHM |
| ELS-7000 | Single Chamber | KrF | 248 nm |
Dry |
30W | 4 kHz | 7.5 mJ | ≤ 1.4 pm FWHM |
| ELS-6010 | Single Chamber | KrF | 248 nm |
Dry |
20W | 2.5 kHz | 8 mJ | ≤ 1.4 pm FWHM |
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