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Glossary

Cymer Lithography Light Sources

Cymer drives innovation in the semiconductor industry. The company's next-generation lithography light sources for all wavelengths and applications provide chipmakers with a competitive edge in performance and a greater return on their capital investments. Using Cymer's technology, chipmakers experience increased laser availability, lower cost of ownership, and greater productivity.

Light Sources At-A-Glance
Product Configuration Gas Wavelength Application Power Repetition Rate Pulse Energy Spectral Bandwidth
XLR 600i Dual Chamber Recirculating Ring ArF 193 nmDouble Patterning / Immersion90W6 kHz 15 mJ ≤ 0.35 pm
E95%
XLR 500i Dual Chamber Recirculating Ring ArF 193 nm Immersion 60W6 kHz10 mJ≤ 0.35 pm
E95%
XLA 400 Dual Chamber ArF 193 nmImmersion60W6 kHz10 mJ≤ 0.35 pm
E95%
XLA 300 Dual Chamber ArF 193 nm Immersion 60W6 kHz10 mJ≤ 0.50 pm
E95%
XLA 200 Dual Chamber ArF 193 nm Dry 60W4 kHz15 mJ≤ 0.50 pm
E95%
XLA 105Dual Chamber ArF 193 nm Dry 45W4 kHz10 mJ≤ 0.50 pm
FWHM
XLA 100Dual Chamber ArF 193 nm Dry 40W4 kHz10 mJ≤ 0.65 pm
FWHM
NanoLith™ 7000 Single Chamber ArF 193 nm Dry 20W4 kHz5 mJ0.95-1.3 pm
FWHM
ELS-7010Single ChamberKrF248 nm Dry 40W4 kHz10 mJ≤ 1.2 pm
FWHM
ELS-7000Single ChamberKrF248 nm Dry 30W4 kHz7.5 mJ≤ 1.4 pm
FWHM
ELS-6010Single ChamberKrF248 nm Dry 20W2.5 kHz8 mJ≤ 1.4 pm
FWHM



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