KrF LIGHT SOURCES

KrF: Lithography Tools at 248 nm Wavelength

Cymer has been providing KrF light sources for high volume chip production since 1996 when chipmakers reached the 250nm production node, which required the adoption of DUV light sources in the fab. Over the years, Cymer has introduced a variety of increasingly powerful and productive KrF light sources, which have provided our customers with the resolution needed for continually shrinking CDs, and the throughput and reliability required for cost-effective production.

The latest in Cymer KrF technology significantly reduces cost of operation through helium free technology, low neon usage, extended module lifetimes. Continued improvements in optics and metrology ensure optimal focus control, maximum exposure latitude, and improved CD control.

ELS-7010

Chamber Single Chamber

Wavelength 248 nm

Power 30-40 W

ELS-7010

The ELS-7010 is one of the leading enablers of new memory architectures such as 3D NAND and is trusted for producing the bulk of layers for Internet of Things and automotive chips. It is also used around the world for high volume manufacturing for patterning the non-critical layers for the most advanced chips due to its cost efficiency. Cymer continues to innovate by introducing improvements that provide up to 50W maximum power output.

Scanner-Laser Associations

Scanner Model

ELS-7010

ASML XT: 860M

ASML XT: 860M

Canon 6300ES6a

Canon 6300ES6a

Nikon S220

Nikon S220