Cymer executives and lithography experts are attending the following industry events this year. To request a meeting, please submit the form at the bottom of this page. We'll contact you to schedule an appointment.
 |
February 2012
|
| 12-16 |
SPIE Advanced Lithography |
Cymer will be at SPIE participating in a number of poster sessions and oral presentations. Check the schedule below and come join us! |
| |
Poster
Sessions |
Wednesday, February 15 | Convention Center Hall 2 | 6 - 8pm
|
| |
|
In-situ Sn Contamination Removal by Hydrogen Plasma |
| |
|
Light Sources for EUVL Patterning at 22nm Node and Beyond |
| |
|
Enhancing Lithography Process Control Through Advanced, On-Board Beam Parameter Metrology for Wafer Level Monitoring of Light Source Parameters
|
| |
|
Field Performance Availability Improvements in Lithography Light Sources Using the iGLX™ Gas Management System |
| |
Award
Presentation |
Thursday, February 16 | Convention Center Ballroom C1 | 10am
2012 Best Student Paper Award in Optical Microlithography |
| |
Oral
Presentations
|
Thursday, February 16 | Location TBD | 9am
Laser-Produced Plasma EUV Sources for Device Development and High Volume Manufacturing |
| |
|
Thursday, February 16 | Convention Center Ballroom C1 | 4:10pm
Advanced Light Source Technologies That Enable High Volume Manufacturing of DUV Lithography Extensions
|
March 2012
| 18-19 |
Semicon China
|
Shanghai, China
One of the largest and most comprehensive annual semiconductor technology conferences in China.
|
|
