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HVM II

Reaching High Volume Manufacturing with EUV

EUV HVM I

The Cymer HVM II.


Specifications
Configuration   Laser-Produced Plasma (LPP)
Wavelength   13.5 nm
Application   EUV
Drive Laser Power   40 kW
Clean EUV Power   > 250W
Repetition Rate    40-60kHz

  Features
  • Improved design for servicability, fast collector and droplet generator exchange.
  • Designed for integration with ASML 3300B EUV Scanners.

Benefits
  • Higher source uptime/availability
  • Available on ASML 3300B scanners starting in H2 2012               
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