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EUV
World's First Integrated LPP EUV Source
An evolution is upon us as Cymer introduces the newest and brightest in light source technology. With new Laser-Produced Plasma (LPP) EUV light sources, Moore’s Law can be extended. By improving LPP technology, Cymer has created the first source that provides scalable power that can enable high volume manufacturing.  The Cymer LPP EUV Source System consists of a high power, high repetition rate pulsed CO2 laser, a beam delivery system, and a plasma vacuum vessel - complete with a droplet generator and collector, debris mitigation, and in-situ metrology to measure, monitor and control the system operation.
How is the EUV light generated in the new source?
The 13.5nm wavelength light is produced when a CO2 laser pulse is "shot" at a droplet of tin (Sn). The laser heats the droplet of tin to the point of evaporation and super-heating to critical temperature, then the atoms shed their electrons and become highly ionized (i.e. a plasma). The ions created by the interaction of the laser pulse and tin emit photons, which are collected by a highly reflective mirror. The mirror reflects and directs the resulting 13.5nm wavelength energy and focuses it through an aperture and into the lithography system. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . EUV Technology LPP vs. DPP |
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