EUV Source
 

World's First Integrated LPP EUV Source
An evolution is upon us as Cymer introduces the newest and brightest in light source technology. With new Laser-Produced Plasma (LPP) EUV light sources, Moore’s Law can be extended. By improving LPP technology, Cymer has created the first source that provides scalable power that can enable high volume manufacturing.

LPP EUV Light Source              

The Cymer LPP EUV Source System consists of a high power, high repetition rate pulsed CO2 laser, a beam delivery system, and a plasma vacuum vessel - complete with a droplet generator and collector, debris mitigation, and in-situ metrology to measure, monitor and control the system operation.

Our leading edge R&D has developed key features of Cymer's new LPP EUV light source, including:

  • High Conversion Efficiency - Sn droplet & 10.6 micron laser
  • High Collection Efficiency - Large collection angle and small source size.
  • Long Lifetime - Isolated plasma

 

How is the EUV light generated in the new source?
The 13.5nm wavelength light is produced when a CO2 laser pulse is "shot" at a droplet of tin (Sn). The laser heats the droplet of tin to the point of evaporation and super-heating to critical temperature, then the atoms shed their electrons and become highly ionized (i.e. a plasma). The ions created by the interaction of the laser pulse and tin emit photons, which are collected by a highly reflective mirror. The mirror reflects and directs the resulting 13.5nm wavelength energy and focuses it through an aperture and into the lithography system.

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EUV Technology
EUV is a major technological advance for semiconductor photolithography.
See how the EUV process will work >

 

LPP vs. DPP
Cymer scientists spent years researching laser produced plasma and discharge produced plasma techniques.
See the differences here >