World's First Integrated LPP EUV Source
An evolution is upon us as Cymer introduces the newest and brightest in light source technology. With new Laser-Produced Plasma (LPP) EUV light sources, Moore’s Law can be extended. By improving LPP technology, Cymer has created the first source that provides scalable power that can enable high volume manufacturing.
The Cymer LPP EUV Source System consists of a high power, high repetition rate pulsed CO2 laser, a beam delivery system, and a plasma vacuum vessel - complete with a droplet generator and collector, debris mitigation, and in-situ metrology to measure, monitor and control the system operation.
Our leading edge R&D has developed key features of Cymer's new LPP EUV light source, including:
EUV is a major technological advance for semiconductor photolithography.
See how the EUV process will work >