| Meeting the Needs for sub-100 nm Lithography Applications
The technically advanced ELS-7010 meets the requirements of high volume production of sub- 0.10 micron devices on 248 nm exposure tools. The ELS-7010 offers chipmakers a 4 kHz, 40 W optical output, plus ultra-narrowed bandwidth performance and high-speed wavelength control. Advanced architecture and materials incorporated into the design of the ELS-7010 significantly reduces the light source cost of operation.
| Specifications |
| Configuration |
|
Single Chamber |
| Gas |
|
KrF |
| Wavelength |
|
248 nm |
| Application |
|
Dry |
| Power |
|
40W |
| Repetition Rate |
|
4kHz |
| Pulse Energy |
|
10mJ |
| Spectral Bandwidth |
|
FWHM < 0.35 pm |
|
|
Features
- Optimal focus control and improved CD control
- Accurate dose control
- Low Cost of Operation
Benefits
- Improved Line Narrowing Package(LNP) and Wavelength Stabilization Module (WSM) ensure optimal focus control, maximum exposure latitude, and improved CD control.
- Proprietary design enhancements ensure accurate and better energy dose control.
- The MICROINJECT® gas algorithm provides superior energy stability while eliminating nonproductive time due to gas injections.
- Cymer’s VERRO® technology provides “on-the-fly” optimization of pulse energy and repetition rate according to specific exposure conditions, such as resist dose sensitivity and optical transmittance.
- Cost of operation has been significantly reduced through new technology to extend module lifetimes.
- Compatible with Cymer OnLine e-Diagnostics and performance monitoring, enabling remote troubleshooting and predictive maintenance.
- Designed for excellence, the ELS-7010 complies with stringent Semiconductor Industry safety standards.
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