Extending the Life of the 193 nm Wavelength Cymer continues to push the limits of our light source capabilities, so that chipmakers can push their design limits. As chipmakers continue to reduce the feature sizes and shrink CDs on the wafer, they need to install the advanced tools required to enable patterning of the most critical layers.

Cymer's portfolio of immersion light sources incorporate the latest productivity improvements. Our newest XLR 600ix is the world’s first argon fluoride (ArF) light source with extendable power to fit changing needs.  Recirculating Ring Technology addresses fundamental dose control performance and solves current cost of ownership limitations. Gas Lifetime eXtension (GLX) offers extended time between gas exchanges increasing scanner availability, and provides additional laser operating stability.  The combination of higher dose stability and longer life modules that are achievable with Cymer’s latest ArF light source systems enable the next generation of immersion lithography tools that help make cost-effective, high-volume sub-45nm semiconductor manufacturing.

XLR 600ix:  Cymer's State-of-the-Art Immersion Light Source
	Cymer's XLR 600ix is the latest in flexible light source technology, specifically designed to adapt to the changing power requirements on the fab floor.
	Features include: Dual Chamber Recirculating Ring Architecture Field extendable power from 60W to 90W Ideal for double patterning applications

XLR 500i:  Cymer's Innovative Immersion Light Source
	When chipmakers looked for an immersion light source solution for 45 nm patterning, Cymer delivered the XLR 500i.
	Features include: Dual Chamber Recirculating Ring Architecture 6kHz repetition rate with up to 60W of power Ideal for double patterning applications

Earlier Generation ArF Immersion Light Sources:

Model	Chamber	Wavelength	Double Patterning	Power
XLR 600i	Dual Chamber Recirculating Ring	193 nm	Yes	90W
XLA 400	Dual Chamber	193 nm	No	60W
XLA 300	Dual Chamber	193 nm	No	60W

How Does Immersion Lithography Work?
By changing the projection medium, chipmakers are able to get smaller feature sizes on ICs. See how Immersion Lithography extends the life of ArF light sources.

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