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ArF Dry Light Sources

Lithography Tools at 193 nm Wavelength

ArF dry lithography is essential in the chipmaking process. ArF dry lithography light sources, like Cymer’s XLA 105 HP, are being used to consistently pattern a significant number of mid-critical layers on wafers, while providing extended module lifetimes and greater critical dimension (CD) control.

As CDs continue to shrink and drive demand for even finer resolution on the most critical layers, ArF dry lithography tools are also patterning the non-critical layers, historically patterned by KrF light sources. Cymer’s dry lithography light sources provide reliability and cost efficiency, and are ideal for use in high volume manufacturing.

XLA 105HP:  Cymer's Leading ArF Dry Light Source
 XLA_105 HP
 

The XLA 105 HP (indicating High Performance) extends the gas lifetime of the light source, significantly improving the availability of the system, and the increased sensitivity of the light source bandwidth metrology offers greater CD control. 
Features include:
  • Gas Lifetime eXtension
  • More sensitive laser bandwidth metrology
  • MOPA Dual Chamber Architecture


Earlier Generation ArF Dry Light Sources:

Model Chamber Wavelength Repetition Rate Power
XLA 200 Dual Chamber (MOPA) 193 nm 4kHz 60W
XLA 105 Dual Chamber (MOPA) 193 nm 4kHz 40W
XLA 100 Dual Chamber (MOPA) 193 nm 4kHz 40W
Nanolith
7000
Single Chamber 193 nm 4kHz 20W

Cymer's range of ArF excimer laser light sources provide leading edge optical and power performance for high volume semiconductor manufacturing applications.

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