Providing leading edge optical and power performance now and in the future
The XLA 105 HP is a productivity improvement of the XLA 105 that extends the gas lifetime of the current system. Additionally, this High-Performance laser is equipped with the more sensitive laser bandwidth metrology (E95) for greater CD control using Optical Proximity Correction.
The XLA 105 HP is a leading-edge argon fluoride (ArF) light source to feature the production-proven, dual-chamber Master Oscillator Power Amplifier (MOPA) platform—enabling both ultra line-narrowed bandwidth and 45 W of output power. Because the XLA 105 HP is built on the existing XL Series platform, customers will enjoy seamless integration into their existing processes and rapid time-to-yield.
With an ultra line-narrowed spectral bandwidth of ≤ 0.2 pm FWHM, the XLA 105 HP provides the light that enables high contrast imaging for lithography tools with an numerical aperture (NA) up to 0.93.
Additionally, the XLA 105 HP can perform wafer patterning at the mid-critical layers and non-critical layers.
| Specifications |
| Configuration |
|
Dual Chamber |
| Gas |
|
Argon Fluoride (ArF) |
| Wavelength |
|
193 nm |
| Application |
|
Dry |
| Power |
|
45W |
| Repetition Rate |
|
4kHz |
| Pulse Energy |
|
11.25mJ |
| Spectral Bandwidth |
|
E95 < 0.50pm
FWHM < 0.20pm |
 |
|
Features
Benefits
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